| 摘要 |
A substrate positioning apparatus and an exposure apparatus includes a rotary circular eccentric cam mechanism as an X direction moving mechanism, in contact with one end of a support body holding a substrate, and rotary circular eccentric cam mechanisms as first and second Y direction moving mechanisms, offset in the X direction with each other, to be in contact with another side of the support body. As a result, a substrate positioning apparatus and an exposure apparatus having simple and inexpensive structure that provides satisfactory accuracy and reliability can be provided.
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