Supporting material, silver halide photographic photosensitive material and photosensitive transfer material

摘要

A supporting material is provided which has excellent antistatic ability and has a high film membrane strength, and in which peeling-off of a layer in a manufacturing process or at the time of handling (coating or conveying) is prevented and white-powder contamination and adhesion of foreign matters caused by falling of an antistatic agent and also failure of liquid film repellency caused by the white-powder contamination and adhesion of foreign matters are prevented. This supporting material also has excellent transparency and high scratch resistance. The supporting material has, on one surface of a substrate, an antistatic layer and a protective layer formed in the order given. The antistatic layer comprises acicular metal oxide grains, and the protective layer comprises an epoxy cross-linking agent and a sulfuric ester based surface active agent represented by CnH2n+1OSO3Na, wherein n represents an integer of 12 to 18.