Verfahren zur Herstellung eines Dünnschichttransistors,申请号DE1997612684-传众专利搜索

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发明名称	Verfahren zur Herstellung eines Dünnschichttransistors
摘要
申请公布号	DE69712684(D1)	申请公布日期	2002.06.27
申请号	DE1997612684	申请日期	1997.07.09
申请人	SONY CORP., TOKIO/TOKYO	发明人	PAL GOSAIN, DHARAM;NAKAGOE, MIYAKO;JIYONASAN, UESUTOOOTAA;USUI, SETSUO
分类号	H01L21/02;H01L21/20;H01L21/268;H01L21/336;H01L27/12;H01L29/786;(IPC1-7):H01L21/336	主分类号	H01L21/02
代理机构		代理人
主权项
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