| 摘要 |
A hot wire chemical vapor deposition method and apparatus for fabricating high quality amorphous, micro-crystalline, and poly-crystalline thin film silicon, or related materials, devices and large area modules is described. A silane gas impinges upon a hot graphite rod assembly whereas the gas is broken up into its individual constituents, these constituents then depositing on an inert substrate member. The distance between the hot graphite rod assembly and the substrate member (11) is adjustable. A shutter (17) is provided to shield the substrate member (11) as the hot graphite rod assembly is heating up. The hot graphite rod assembly contains a plurality of mutually parallel and coplanar rods (18) that are parallel to the plane of the substrate member (11), and the hot graphite rod assembly and/or the substrate (11) is oscillated in a direction generally normal to the direction in which the rods (18) extend.
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