METHOD AND SYSTEM FOR IMPROVING STABILITY OF PHOTOMASKS

摘要

A method of and system for reducing the absorption of light by opaque material in a photomask (1202) utilizes opaque material (1230). The method includes providing a photomask substrate (1210), and applying the opaque material (1230) to one side of the photomask substrate (1210). The interface between the opaque material (1230) and photomask substrate (1210) can reflect at least 80 percent of the light through the photomask.