发明名称 |
Device and method for improved electrostatic discharge protection |
摘要 |
A method includes introducing into an integrated circuit a device comprising a transistor including a drain of a first conductivity type and a first concentration in a well of a first conductivity type and a second concentration, a first region of the first conductivity type and first concentration in the well, and a second region of a second conductivity type in the well between the first region and the drain. The method also includes coupling the device to a pad. In the presence of a pre-determined current at the pad, the device biases a junction between the second region and the well toward current flow in the absence of a latch-up event.
|
申请公布号 |
US2002079541(A1) |
申请公布日期 |
2002.06.27 |
申请号 |
US20010021543 |
申请日期 |
2001.10.22 |
申请人 |
PARAT KRISHA K.;CLARK NEAL K.;MALONEY TIMOTHY J. |
发明人 |
PARAT KRISHA K.;CLARK NEAL K.;MALONEY TIMOTHY J. |
分类号 |
H01L27/02;(IPC1-7):H01L23/62;H01L21/20 |
主分类号 |
H01L27/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|