| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for removing impurities from a methylsilane. SOLUTION: The methylsilane containing the impurities such as carbon dioxide, chlorosilanes and atmospheric gases is fed from a methylsilane source cylinder 12 to an adsorption unit 22 comprising an adsorbent such as magnesium silicate, alumina, silica gel, molecular sieves, zeolite. The adsorption unit 22 is kept at -40 deg.C in a stainless steel Dewar vessel 24. The methylsilane purified with the adsorption unit 22 is fed to a receiver unit 35 which is kept at -190 deg.C in a stainless steel Dewar vessel 33.
|
