发明名称 APPARATUS FOR CLEANING QUARTZ PARTS OF EQUIPMENT FOR FABRICATING SEMICONDUCTOR
摘要 PURPOSE: An apparatus for cleaning quartz parts of equipment for fabricating a semiconductor is provided to stably clean the quartz parts and to minimize waste of the quartz parts, by stopping a basket loaded with the quartz part transferring in a chemical bath while the basket does not collide with a pillar or wall of the chemical bath. CONSTITUTION: Chemicals is received in the chemical bath(10). The basket(20) loaded with the quartz parts(P) is inserted into the chemical bath and is transferred. The quartz part passing through the chemical bath is rinsed in a deionized water bath(30). A damping stopper(13) comes in contact with the front end of the basket to control the transfer of the basket, disposed in the transfer path of the basket of the chemical bath and separated from the wall of the chemical bath by a proper interval.
申请公布号 KR20020050023(A) 申请公布日期 2002.06.26
申请号 KR20000079358 申请日期 2000.12.20
申请人 ANAM SEMICONDUCTOR., LTD. 发明人 CHOI, WON GEUN
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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