| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in dynamic performance, having high sensitivity, capable of giving a relief plate having clear image reproducibility, and further to provide the one having less chlorine content. SOLUTION: The photosensitive resin composition contains a polyvinyl acetate saponified by 60-99 mol% saponification, a photopolymerizable unsaturated group-containing monomer and a photopolymerization initiator. The photopolymerizable unsaturated group-containing monomer is a monomer derived from an epoxy compound or its precursor and the chlorine content of the composition is <=0.2 wt.%. |
