MALEIMIDE-BASED POLYMER AND COMPOSITION FOR RESIST

摘要

PROBLEM TO BE SOLVED: To obtain a maleimide-based polymer useful as a resin for a photoresist having excellent dry-etching resistance. SOLUTION: This maleimide-based polymer comprises at least a unit expressed by the formula (1) (where ring Z denotes a polycyclic hydrocarbon which may have substituent(s); X denotes an alkylene group; and n is 0 or 1), in which Z may be a cross-linked type hydrocarbon ring which may have substituent(s) and at least a ring among hydrocarbon rings constituting the cross-linked hydrocarbon rings may be a ring forming a lactone ring. The maleimide-based polymer is useful to be used as a resist composition in combination with a photo-acid generator.