发明名称 SPUTTERING TARGET SINTERED MATERIAL FOR FORMING PHOTORECORDING MEDIUM PROTECTIVE LAYER EXHIBITING EXCELLENT CRACKING DAMAGE RESISTANCE IN HIGH OUTPUT SPUTTERING CONDITION
摘要 PROBLEM TO BE SOLVED: To provide a target material for forming a photorecording medium protective layer which is consisting of a hot press sintered body of a powdery mixture having a blended composition consisting of 6 to 40% SiO2 and 1 to 6% MgO, and the balance ZnS and exhibits excellent cracking damage resistance in a high output sputtering condition. SOLUTION: The target material for forming a photorecording medium protective layer is consisting of a hot press sintered body of a powdery mixture having a blended composition consisting of, by mol, 6 to 40% silicon oxide and 1 to 6% magnesium oxide, and the balance zinc sulfide.
申请公布号 JP2002180244(A) 申请公布日期 2002.06.26
申请号 JP20000383021 申请日期 2000.12.18
申请人 MITSUBISHI MATERIALS CORP 发明人 MISHIMA TERUSHI;WATANABE KAZUO;MORI RIE
分类号 C04B35/547;C23C14/34;G11B7/24;G11B7/254;G11B7/257;G11B7/26 主分类号 C04B35/547
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