发明名称 |
SPUTTERING TARGET SINTERED MATERIAL FOR FORMING PHOTORECORDING MEDIUM PROTECTIVE LAYER EXHIBITING EXCELLENT CRACKING DAMAGE RESISTANCE IN HIGH OUTPUT SPUTTERING CONDITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a target material for forming a photorecording medium protective layer which is consisting of a hot press sintered body of a powdery mixture having a blended composition consisting of 6 to 40% SiO2 and 1 to 6% MgO, and the balance ZnS and exhibits excellent cracking damage resistance in a high output sputtering condition. SOLUTION: The target material for forming a photorecording medium protective layer is consisting of a hot press sintered body of a powdery mixture having a blended composition consisting of, by mol, 6 to 40% silicon oxide and 1 to 6% magnesium oxide, and the balance zinc sulfide. |
申请公布号 |
JP2002180244(A) |
申请公布日期 |
2002.06.26 |
申请号 |
JP20000383021 |
申请日期 |
2000.12.18 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
MISHIMA TERUSHI;WATANABE KAZUO;MORI RIE |
分类号 |
C04B35/547;C23C14/34;G11B7/24;G11B7/254;G11B7/257;G11B7/26 |
主分类号 |
C04B35/547 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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