| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a photobleaching waveguide which has a high yield, low scattering loss and uniform geometry. SOLUTION: A polymer layer 3a for photobleaching is covered in a sandwich structure by a buffer layer 2 and an upper clad layer 5, a UV light beam 10 is irradiated from the upper surface side of the upper clad layer 5 or the undersurface side of the buffer layer 2, and patterning is performed so that the polymer layer 3a changes a refractive index. Thereby, a level difference is not generated on the polymer layer 3a, namely a core layer 3, and the surfaces of side clad layers 4-1 and 4-2. This is because the polymer layer 3a has a sandwich structure adhered by the buffer layer 2 and the upper clad layer 5. As a result, a photobleaching waveguide with uniform geometry and super-low scattering loss can be realized. |
