| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming apparatus capable of continuously forming film so as to have a sufficiently dense structure in the initial stage of a film forming process. SOLUTION: The apparatus is provided with an electrode 8, which is arranged in a vacuum container 2 and generates a high frequency electric field inside the vacuum container 2, an evaporation source 7 to contain a film material M, a transport apparatus 9 to transport a substrate, a plasma generating space 3 and a transport space 4 of the substrate formed in the vacuum container 2 and a boundary wall 6, which is arranged between the plasma generating space 3 and the transport space 4 and in which a film forming slit 5 is opened, the film forming slit 5 is successively constituted of a first slit 51 of a small area, a second slit 52 of a large area, and a third slit 53 of a small area in order from the upstream side along an advancing direction of the substrate W.
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