发明名称 |
METHOD FOR REFINING BASE POLYMER OF RESIST |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for refining the base polymer of a resist by efficiently diminishing a metal impurity in the base polymer. SOLUTION: In the method for refining the base polymer of a resist, a water- soluble compound having complex forming ability is added to the base polymer or a solution of the base polymer in a non-polar organic solvent or a mixed solvent comprising non-polar and polar organic solvents by an amount not less than the equivalent of a metal impurity in the base polymer, reaction is completed and the base polymer is washed with pure water to diminish the metal impurity in the base polymer. |
申请公布号 |
JP2002182402(A) |
申请公布日期 |
2002.06.26 |
申请号 |
JP20000383206 |
申请日期 |
2000.12.18 |
申请人 |
SHIN ETSU CHEM CO LTD |
发明人 |
HAMADA YOSHITAKA;HATAKEYAMA JUN |
分类号 |
G03F7/039;G03F7/26;G03F7/38 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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