发明名称 METHOD FOR REFINING BASE POLYMER OF RESIST
摘要 PROBLEM TO BE SOLVED: To provide a method for refining the base polymer of a resist by efficiently diminishing a metal impurity in the base polymer. SOLUTION: In the method for refining the base polymer of a resist, a water- soluble compound having complex forming ability is added to the base polymer or a solution of the base polymer in a non-polar organic solvent or a mixed solvent comprising non-polar and polar organic solvents by an amount not less than the equivalent of a metal impurity in the base polymer, reaction is completed and the base polymer is washed with pure water to diminish the metal impurity in the base polymer.
申请公布号 JP2002182402(A) 申请公布日期 2002.06.26
申请号 JP20000383206 申请日期 2000.12.18
申请人 SHIN ETSU CHEM CO LTD 发明人 HAMADA YOSHITAKA;HATAKEYAMA JUN
分类号 G03F7/039;G03F7/26;G03F7/38 主分类号 G03F7/039
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