| 摘要 |
PROBLEM TO BE SOLVED: To provide a plastic substrate showing high resistance to heat, chemical and plasma and a method for manufacturing a thin film laminated device using the plastic substrate. SOLUTION: The plastic substrate 1 comprises a sheet-like plastic film base material 2, surface protecting films 3 and 4 and a side protecting film 5. The surface protecting film 3 is formed on one of the surfaces 2a of the plastic film base material 2 and the surface protecting film 4 is formed on the other surface 2b. In addition, a side protecting film 5 is formed so as to cover the interfaces of the plastic film base material 2, the surface protecting film 3 and the surface protecting film 4, on the side 2c of the plastic film base material 2, and the side 3c of the surface protecting film 3 and the side 4c of the surface protecting film 4. Consequently, the plastic base material 1 shows high resistance to heat, chemical and plasma.
|
