发明名称 |
NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN |
摘要 |
The present invention has a purpose of providing a non-ionic compound, a resin, a resist composition used in a resist composition being able to produce a resist pattern with less defects and excellent CD uniformity. A resin including a structural unit derived from a non-ionic compound with a group represented by Formula (Ia) and a resist composition containing the resin. In Formula (Ia), R2 represents a group having an alicyclic hydrocarbon group with 3 to 18 carbon atoms. Rf1 and Rf2 each represent independently a perfluoroalkyl group with 1 to 4 carbon atoms, and an asterisk mark(*) represents a bonding hand. |
申请公布号 |
KR20160063275(A) |
申请公布日期 |
2016.06.03 |
申请号 |
KR20150165788 |
申请日期 |
2015.11.25 |
申请人 |
SUMITOMO CHEMICAL CO., LTD. |
发明人 |
MASUYAMA TATSURO;MUKAI YUICHI;ICHIKAWA KOJI |
分类号 |
C07C69/653;C07C69/67;C07C69/73;C08F20/22;C08F20/28;C08L33/16;G03F7/027;G03F7/039;G03F7/38;H01L21/027 |
主分类号 |
C07C69/653 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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