发明名称 NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
摘要 The present invention has a purpose of providing a non-ionic compound, a resin, a resist composition used in a resist composition being able to produce a resist pattern with less defects and excellent CD uniformity. A resin including a structural unit derived from a non-ionic compound with a group represented by Formula (Ia) and a resist composition containing the resin. In Formula (Ia), R2 represents a group having an alicyclic hydrocarbon group with 3 to 18 carbon atoms. Rf1 and Rf2 each represent independently a perfluoroalkyl group with 1 to 4 carbon atoms, and an asterisk mark(*) represents a bonding hand.
申请公布号 KR20160063275(A) 申请公布日期 2016.06.03
申请号 KR20150165788 申请日期 2015.11.25
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 MASUYAMA TATSURO;MUKAI YUICHI;ICHIKAWA KOJI
分类号 C07C69/653;C07C69/67;C07C69/73;C08F20/22;C08F20/28;C08L33/16;G03F7/027;G03F7/039;G03F7/38;H01L21/027 主分类号 C07C69/653
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