发明名称 RESIDUE-REMOVING LIQUID AND METHOD FOR PRODUCING PRINTED CIRCUIT BOARD USING THE LIQUID
摘要 PROBLEM TO BE SOLVED: To solve the problem of the short-circuit of a conductor circuit or the narrowing of the gap between adjacent conductor circuits caused by the residual seed layer of a prescribed region in the etching of the seed layer holding a residue on the copper layer of the seed layer after the resist peeling treatment. SOLUTION: The residue-removing liquid is effective for removing the residue left after the peeling of the resist containing a photo-reaction initiator and formed on a circuit board with an alkaline resist-peeling liquid. The removing liquid contains an organic acid and a nitrogen-containing compound.
申请公布号 JP2002180095(A) 申请公布日期 2002.06.26
申请号 JP20000375496 申请日期 2000.12.11
申请人 FUJITSU LTD 发明人 TANI MOTOAKI;HAYASHI NOBUYUKI;MACHIDA HIROYUKI
分类号 G03F7/42;C11D7/26;C11D7/32;C11D7/50;H05K3/18;H05K3/46;(IPC1-7):C11D7/32 主分类号 G03F7/42
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