| 摘要 |
PROBLEM TO BE SOLVED: To enhance performance in the microfabrication of a semiconductor device using electron beams or X-rays and to provide a positive type resist composition for electron beams or X-rays which satisfies sensitivity, resolution and resist shape to the use of electron beams or X-rays. SOLUTION: The positive type resist composition for electron beams or X-rays contains (A) a resin having at least one of specified repeating units of formula (III) or (IV) and (B) a compound having a disulfone group. |
