| 摘要 |
PROBLEM TO BE SOLVED: To provide a film depositing apparatus and a film method, by which a high precision film having a desired film thickness distribution on the inside surface of a hollow member is deposited, and to provide an optical member having the film deposited with a high precision on the inside surface to have a desired film thickness distribution and having high reflectance, an illuminating optical system for illuminating using the optical member and an exposure apparatus having the illuminating optical system. SOLUTION: A hollow integrator 100 is firmly grasped by a chuck 110 having a center axis 102 in common, gas to be a raw material for the film is filled inside by a gaseous starting material feed pipe 120 and a gas discharge pipe 122, a light guide system 124 and an imaging optical system 126, which are film depositing means, are arranged and the film is deposited locally on the inside surface of the integrator 100 by the film depositing means. The film depositing means are fixed to a part out of a stage, the integrator is rotatable around the center axis 102 with respect to the film depositing means and also moves in the center axis 102 direction.
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