| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem in conventional inspection apparatus and inspection method using a Fourier transform filter that a reflecting light from an edge of an irregular circuit pattern cannot be removed although the apparatus and method are effective to remove a diffraction light from a repeated pattern, and consequently sophisticated image processing such as processing the edge, distinguishing foreign matters from false failures in the vicinity of the edge, etc., is required. SOLUTION: There are arranged a stage 1 where a wafer 9 is loaded, a light-emitting means 2 for irradiating light beams to the wafer 9 from slantwise to the wafer 9, a light-receiving means 3 for collecting a scattering light from a foreign matter 11 on the wafer 9 by an objective lens 7 and imaging on a photo detector 8, an inspecting part 4 for discriminating the foreign matter by image processing the detected result of the photo detector 8, a spatial filter 5 placed in front of the objective lens 7 of the light-receiving means 3 for shielding the reflecting light 13 of the edge part of the circuit pattern 10 on the wafer 9, and a computer 6 for controlling the whole.
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