发明名称 APPARATUS AND METHOD FOR DRESSING PAD OF BOTH-SURFACE POLISHER
摘要 PURPOSE: An apparatus for dressing a pad of a both-surface polisher is provided to make a brush block automatically driven by a dresser arm and to prevent generation of fine particles caused by wear-out of the brush block. CONSTITUTION: The first pad(34) is attached to a lower plate(33). The second pad(40) is attached to an upper plate(39). An inner gear(35) is formed in the center of the lower plate. An outer gear(37) is formed in the edge of the first pad. A groove(41) is formed in a portion corresponding to the inner gear of the upper plate. An exhausting pipe(51) sprays deionized water at a high pressure so that a solid matter fixed to the first and second pads are separated. A pressure unit(49) increases the pressure of the deionized water and supplies the deionized water to the exhausting pipe. The brush block(47) eliminates the solid matter separated from the first and second pads, reciprocating between the inner gear and the outer gear. The dresser arm(53) makes the brush block vertically move so that the brush block comes in contact with the first pad.
申请公布号 KR20020049147(A) 申请公布日期 2002.06.26
申请号 KR20000078243 申请日期 2000.12.19
申请人 SILTRON INC. 发明人 KIM, HYEON CHEOL
分类号 H01L21/302;(IPC1-7):H01L21/302 主分类号 H01L21/302
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