发明名称 |
DOPED ULTRA-LOW EXPANSION GLASS AND METHODS FOR MAKING THE SAME |
摘要 |
A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm. |
申请公布号 |
US2016168010(A1) |
申请公布日期 |
2016.06.16 |
申请号 |
US201514958024 |
申请日期 |
2015.12.03 |
申请人 |
Corning Incorporated |
发明人 |
Annamalai Sezhian;Duran Carlos Alberto;Hrdina Kenneth Edward |
分类号 |
C03C3/06;C03B25/02;C03B19/14;C03C3/112;C03C4/00 |
主分类号 |
C03C3/06 |
代理机构 |
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代理人 |
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主权项 |
1. A doped silica-titania glass article, comprising:
a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant, wherein the fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %, and further wherein the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20° C. |
地址 |
Corning NY US |