ALKALI NEGATIVE DEVELOPMENT TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN AND ELECTRONIC PARTS

摘要

PROBLEM TO BE SOLVED: To provide an alkali negative development type photosensitive resin composition excellent in developability with an aqueous alkali solution, a method for producing a pattern and electronic parts excellent in reliability. SOLUTION: The alkali negative development type photosensitive resin composition contains (a) a photosensitive polyimide precursor soluble in an aqueous alkali solution, (b) an addition polymerizable compound, (c) a photosensitive agent and (d) a dissolution controlling agent soluble in the aqueous alkali solution.