发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in resolution, adhesion, sensitivity, plating bath contaminating property and product stability. SOLUTION: In the photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in a single molecule and (C) a photopolymerization initiator, a compound of formula (I) and a tris(dimethylaminomethyl)phenol derivative are contained as the component (C) by >=0.005 pt.wt. based on 100 pts.wt., in total, of the components (A) and (B).
申请公布号 JP2002182386(A) 申请公布日期 2002.06.26
申请号 JP20000380539 申请日期 2000.12.14
申请人 HITACHI CHEM CO LTD 发明人 ITAGAKI KATSUTOSHI;OTOMO SATOSHI;KAJIWARA TAKUYA;ABE TAKUJI
分类号 G03F7/031;C08F2/44;C08F2/50;C08F257/00;G03F7/004;G03F7/027;G03F7/033;H05K3/06;H05K3/18 主分类号 G03F7/031
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