发明名称 METHOD FOR MANUFACTURING MICROLENS SUBSTRATE, MICROLENS SUBSTRATE, METHOD FOR MANUFACTURING ELECTROOPTICAL DEVICE, ELECTROOPTICAL DEVICE, AND PROJECTION TYPE DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a microlens substrate, a microlens substrate, a method for manufacturing an electro-optic device, an electro-optic device and a projection display device in which the quality of images can be improved by improving the shape accuracy of the microlens. SOLUTION: In the manufacturing process of a counter substrate (microlens substrate) of a liquid crystal device, a mask layer 60 having openings 61 as small as 0.5 to 4 μm diameter for substrate etching is formed on the surface of a first transparent substrate 20, the surface of the counter substrate 20 is subjected to wet etching through the openings 61 for substrate etching to form a recessed curved part 26, and then the recessed curved part 26 is filled with a transparent material to form the microlens substrate.
申请公布号 JP2002182586(A) 申请公布日期 2002.06.26
申请号 JP20000376292 申请日期 2000.12.11
申请人 SEIKO EPSON CORP 发明人 SAITO HIROMI;YOTSUYA SHINICHI
分类号 G02F1/1335;G02B3/00;G09F9/30 主分类号 G02F1/1335
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