发明名称 |
METHOD FOR MANUFACTURING MICROLENS SUBSTRATE, MICROLENS SUBSTRATE, METHOD FOR MANUFACTURING ELECTROOPTICAL DEVICE, ELECTROOPTICAL DEVICE, AND PROJECTION TYPE DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a microlens substrate, a microlens substrate, a method for manufacturing an electro-optic device, an electro-optic device and a projection display device in which the quality of images can be improved by improving the shape accuracy of the microlens. SOLUTION: In the manufacturing process of a counter substrate (microlens substrate) of a liquid crystal device, a mask layer 60 having openings 61 as small as 0.5 to 4 μm diameter for substrate etching is formed on the surface of a first transparent substrate 20, the surface of the counter substrate 20 is subjected to wet etching through the openings 61 for substrate etching to form a recessed curved part 26, and then the recessed curved part 26 is filled with a transparent material to form the microlens substrate. |
申请公布号 |
JP2002182586(A) |
申请公布日期 |
2002.06.26 |
申请号 |
JP20000376292 |
申请日期 |
2000.12.11 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SAITO HIROMI;YOTSUYA SHINICHI |
分类号 |
G02F1/1335;G02B3/00;G09F9/30 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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