| 摘要 |
PURPOSE: An align key pattern used for aligning a substrate and an optical device is provided to easily recognize a very small displacement by aligning the substrate and the optical device, and to improve productivity of an optical transmitter and an optical receiver by more easily and precisely re-aligning the substrate and the optical device. CONSTITUTION: A main scale(301,302,303,304) is formed on a surface of the substrate(100) or optical device(200), having the first reference line(310,330) and scales maintaining a uniform interval from the first reference line. A vernier(401,402,403,404) is formed on a surface of the substrate or optical device in which the mother scale is not formed, having the second reference line(410,430) and scales maintaining an interval smaller than that of the mother scale from the second reference line.
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