| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treatment apparatus, with which the film quality can be improved. SOLUTION: The surface treatment apparatus has a treatment vessel 1, in which a gaseous starting material and a carrier gas are introduced, and a cylindrical rotary electrode 2 provided so as to rotate in the treatment vessel 1 and is provided with a radical generating means for generating radical with the excitation of a carrier gas by plasma discharge between the rotary electrode 2 and the radical generating means at a 1st position A on the upstream side from a substrate 4 in the electrode rotating direction at the time of surface- treating the substrate 4 arranged closely to the rotary electrode 2 with plasma discharge generated in the surroundings of the rotary electrode 2, and a gaseous starting material supply means for supplying the gaseous starting material to a 2nd position B positioned in the downstream side of the 1st position A in the electrode rotating direction and the upstream side of the substrate 4 in the electrode rotating direction, and the substrate 4 is surface-treated by the reaction of the radical generated at the 1st position A with the gaseous starting material supplied to the 2nd position. |
