发明名称 PHOTOSENSITIVE MATERIAL PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To actively prevent entry of a vaporized processing liquid or vapor into the exposure side by eliminating the need for clearance for driving a shutter plate provided so as to be freely opened/closed, in a shutter device that blocks/ unblocks a communicating hole between a first chamber on the exposure side and a second chamber on the processing liquid tank side. SOLUTION: A shutter device 15 is composed of the shutter plate 31 which is pivotally supported at a base 30, a torsion spring which moves and presses the shutter plate 31 into a closing position, and an electromagnetic solenoid which drives the shutter plate 31 to an opening position. The shutter plate is integrally formed from a metal plate member 31 and an elastic member 33. When the shutter plate is in the closing position, the elastic member tightly closes the entire periphery of the opening.
申请公布号 JP2002182360(A) 申请公布日期 2002.06.26
申请号 JP20000377771 申请日期 2000.12.12
申请人 NIDEC COPAL CORP 发明人 MURAYAMA KAZUAKI
分类号 G03D3/00;G03B27/46;G03D13/00;(IPC1-7):G03D13/00 主分类号 G03D3/00
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