发明名称 Sputtering target and its manufacturing method
摘要 An ingot is made from a used target of 30 weight % or more, and new metals of the same components, and recycled alloy powder is made by a gas atomizing process. Magnetic permeability is controlled not to exceed 2 by adjusting the content of rare earth metals in rare earth alloy powder to be at least 35 weight %. By blending the recycled alloy powder with other powder to produce alloy powder containing at least 50 weight % of rare earth alloy powder having a magnetic permeability not higher than 2 and containing at least 65 weight % of rare earth alloy powder. By sintering the alloy powder under pressure and thereafter cutting top, bottom and side surfaces of the sintered material, a target having a magnetic permeability not higher than 2 and having a thickness not less than 8 mm is fabricated.
申请公布号 US6409965(B1) 申请公布日期 2002.06.25
申请号 US20000666241 申请日期 2000.09.21
申请人 SONY CORPORATION 发明人 NAGATA TAKAHIRO;SASAKI MANABU;KIMURA HITOSHI;YOKOYAMA NORIO
分类号 G11B11/105;C23C14/34;(IPC1-7):C22C32/00;B22F1/00;C22C1/00;C22C14/34 主分类号 G11B11/105
代理机构 代理人
主权项
地址