PHOTO MASK TRANSFERING SYSTEM

摘要

The present invention a photo mask transferring system to effectively automate a photo mask loading system to prevent a haze generated in a photo mask used for a semiconductor manufacturing process. The photo mask transferring system comprises: a packing conclusion device to pack and load the packed photo mask; a transferring device to automatically transfer the packed photo mask from the packing conclusion device; and an air conditioning device to maintain an atmosphere inside the packing conclusion device and the transferring device as a nitrogen atmosphere and to equally maintain pressure of the packing conclusion device and the transferring device. The photo mask transferring system recognizes and equally maintains external pressure and internal pressure by using a sensor when the photo mask is inserted into the transferring device and the packing conclusion device. Therefore, the photo mask transferring system provides an effect capable of reducing a waiting time in the mass production of a wafer by removing a bending generated in a pellicle.