| 摘要 |
PROBLEM TO BE SOLVED: To facilitate the control of the coating quality of a resist in a resist coating apparatus. SOLUTION: A discharge nozzle for coating a semiconductor wafer with the resist, a fiberscope 32 for supplying image pickup data to a CCD camera 34 and a fiber driving part 40 for moving the leading end of the fiberscope 32 to the leading end position of the resist discharge nozzle are provided. On the basis of the image picked up by the fiberscope 32, it is judged whether foreign matter is adhered to the discharge nozzle. When the foreign matter is recognized, a brush 46 is moved by a cleaning mechanism driving part 44 to remove the foreign matter by the brush 46. |
