发明名称 |
Optical monitor for real time thickness change measurements via lateral-translation induced phase-stepping interferometry |
摘要 |
An optical monitoring instrument monitors etch depth and etch rate for controlling a wet-etching process. The instrument provides means for viewing through the back side of a thick optic onto a nearly index-matched interface. Optical baffling and the application of a photoresist mask minimize spurious reflections to allow for monitoring with extremely weak signals. A Wollaston prism enables linear translation for phase stepping.
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申请公布号 |
US6411389(B1) |
申请公布日期 |
2002.06.25 |
申请号 |
US20000564073 |
申请日期 |
2000.05.03 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CLAIFORNIA |
发明人 |
RUSHFORD MICHAEL C. |
分类号 |
G01B11/06;(IPC1-7):G01B9/02 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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