发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which can prevent semiconductor chips from being out of alignment in a process of division into a plurality of semiconductor chips and a process of increasing intervals among the plurality of semiconductor chips.SOLUTION: A semiconductor device manufacturing method comprises: a process of forming trenches W5 with a cutting depth shallower than a thickness of a semiconductor wafer W on a first surface W1 of the semiconductor wafer W; a process of attaching a first adhesive sheet 10 to a first surface W1 where the trenches W5 are formed; a process of grinding a second surface W6 of the semiconductor wafer W to decrease a thickness of the semiconductor wafer W and dividing the semiconductor wafer W into a plurality of semiconductor chips CP; a process of attaching a second adhesive sheet to a third surface W3 exposed by grinding of the second surface W6; a process of removing the first adhesive sheet 10; and a process of stretching the second adhesive sheet to increase intervals among a plurality of semiconductor chips CP.SELECTED DRAWING: Figure 1
申请公布号 JP2016127116(A) 申请公布日期 2016.07.11
申请号 JP20140266140 申请日期 2014.12.26
申请人 LINTEC CORP 发明人 OKAMOTO NAOYA;SATO AKINORI;FUJIMOTO YASUSHI;MENJU TOSHIAKI;YAMADA TADATOMO;KAWASAKI YOSHIHIKO
分类号 H01L21/301;H01L21/56;H01L21/683;H01L23/12 主分类号 H01L21/301
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