发明名称 |
SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which can prevent semiconductor chips from being out of alignment in a process of division into a plurality of semiconductor chips and a process of increasing intervals among the plurality of semiconductor chips.SOLUTION: A semiconductor device manufacturing method comprises: a process of forming trenches W5 with a cutting depth shallower than a thickness of a semiconductor wafer W on a first surface W1 of the semiconductor wafer W; a process of attaching a first adhesive sheet 10 to a first surface W1 where the trenches W5 are formed; a process of grinding a second surface W6 of the semiconductor wafer W to decrease a thickness of the semiconductor wafer W and dividing the semiconductor wafer W into a plurality of semiconductor chips CP; a process of attaching a second adhesive sheet to a third surface W3 exposed by grinding of the second surface W6; a process of removing the first adhesive sheet 10; and a process of stretching the second adhesive sheet to increase intervals among a plurality of semiconductor chips CP.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016127116(A) |
申请公布日期 |
2016.07.11 |
申请号 |
JP20140266140 |
申请日期 |
2014.12.26 |
申请人 |
LINTEC CORP |
发明人 |
OKAMOTO NAOYA;SATO AKINORI;FUJIMOTO YASUSHI;MENJU TOSHIAKI;YAMADA TADATOMO;KAWASAKI YOSHIHIKO |
分类号 |
H01L21/301;H01L21/56;H01L21/683;H01L23/12 |
主分类号 |
H01L21/301 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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