发明名称 LASER IRRADIATING DEVICE, LASER IRRADIATING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 AN OBJECT OF THE PRESENT INVENTION IS TO PROVIDE A METHOD AND A DEVICE FOR CONSTANTLY SETTING THE ENERGY DISTRIBUTION OF A LASER BEAM (101) ON AN IRRADIATING FACE, AND UNIFORMLY IRRADIATING THE ELASER BEAM TO THE ENTIRE IRRADIATING FACE. FUTHER, ANOTHER OBJECT OF THE PRESENT INVENTION IS TO PROVIDE A MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE INCLUDING THIS LASER IRRADIATING METHOD IN A PROCESS. THEREFORE, THE PRESENT INVENTION IS CHARACTERIZED IN THAT THE SHAPES OF PLURAL LASER BEAMS (103A, 103B, 103C) ON THE IRRADIATING FACE ARE FORMED BY AN OPTICAL SYSTEM IN AN ELLIPTICAL SHAPE OR A RECTANGULAR SHAPE, AND THE PLURAL LASER BEAMS (103A, 103B, 103C) ARE IRRADIATED WHILE THE IRRADIATING FACE IS MOVED IN A FIRST DIRECTION, AND THE PLURAL LASER BEAMS (103A, 103B, 103C) ARE IRRADIATED WHILE THE IRRADIATING FACE IS MOVED IN A SECOND DIRECTION AND IS MOVED IN A DIRECTION REVERSE TO THE FIRST DIRECTION. THE PLURAL LASER BEAMS (103A, 103B, 103C) MAY BE IRRADIATED WHILE THE IRRADIATING FACE IS MOVED IN THE FIRST DIRECTION, AND THE PLURAL LASER BEAMS (103A, 103B, 103C) MAY BE IRRADIATED WHILE THE IRRADIATING FACE IS MOVED IN THE DIRECTION REVERSE TO THE FIRST DIRECTION, AND THE IRRADIATING FACE MAY BE ALSO MOVED IN THE SECOND DIRECTION.
申请公布号 MY157663(A) 申请公布日期 2016.07.15
申请号 MY2002PI02902 申请日期 2002.08.01
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 KOICHIRO TANAKA
分类号 B23K26/00;H01S5/06;B23K26/06;B23K26/067;B23K26/073;B23K26/10;H01L21/20 主分类号 B23K26/00
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