发明名称 |
Methods utilizing antireflective coating compositions with exposure under 200 nm |
摘要 |
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
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申请公布号 |
US6410209(B1) |
申请公布日期 |
2002.06.25 |
申请号 |
US19980153575 |
申请日期 |
1998.09.15 |
申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
ADAMS TIMOTHY G.;PAVELCHEK EDWARD K.;SINTA ROGER F.;DOCANTO MANUEL;BLACKSMITH ROBERT F.;TREFONAS, III PETER |
分类号 |
H01L21/027;C08F220/10;G03F7/039;G03F7/09;G03F7/11;(IPC1-7):G03C5/00;G03F7/26 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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