Photolithographic method for fabricating micro-relief optical original discs, cards and other optical elements and micro-miniaturized devices

摘要

A contactless nondestructive method has been proposed for checking and adjusting the quality of spatial volumetric topology of the latent pattern image as a spatial pattern of information pits of optical disc original precursors or a pattern of precursors of micro-relief regions of various diffractive optical elements and micro-miniaturized original devices photolithographically generated in a photoresist layer and designated for subsequent fabrication of stampers thereof and further mass replication using injection moulding or photopolymerization. Said method includes illumination of the photoresist layer by polarized photochemically active radiation carrying information about the future spatial micro-structure of various micro-relief original products and reproduction of the spatial topology generated in the layer prior to the development of the exposed layer again using polarized but this time photochemically inactive radiation.