RESIST COMPOSITION FOR RESIN BLACK MATRIX

摘要

PURPOSE: Provided is a resist composition for resin black matrix having improved resolution, pattern stability and shielding property of high optical density. CONSTITUTION: The composition is prepared by the steps of adding 5-95 wt% of polyfunctional monomers based on the total resin solid, 0.1-50 wt%(based on total resin solid) of photopolymerization initiator, 5-15 wt% of carbon black, 0.1-10 wt% of silicon based compound containing epoxy group, 0.1-3 wt% of composition comprising known photosensitizer, thermal polymerization inhibitor, antifoaming agent, leveling agent, and so on, and solvent, to binder resin mixture obtained by mixing binder resins of formula 1 and 2 in ratio of 0:100 to 100:0. In the formula 1 and 2, X represents a hydrogen atom or a methyl group, Y1 represents an alkyl group or a hydroxyalkyl group having C2-C16.