METHOD FOR MEASURING STEP COVERAGE AND APPARATUS FOR PERFORMING THE SAME

摘要

PURPOSE: A measurement method of a step coverage is provided to prevent a damage of an apparatus and an incorrect measurement due to a measurement of a direct contact by indirectly measuring a step coverage between defined positions. CONSTITUTION: A measurement method of a step coverage comprises a first step(S10) focusing on a first position of a wafer by condensing a first light, a second step(S12) moving a wafer chuck as a defined interval, a third step(S14) focusing on a second position of the wafer by condensing a second light, a fourth step(S16) outputting an up and down moving distance for focusing on the second position, a fifth step(S18) outputting the interval between the first position and the second position, and a last step(S20,S22) measuring the step coverage between the first and second positions.