POSITIVE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive photoresist composition having excellent resolution and edge roughness of line pattern and hardly causing developing defect in the manufacture of a semiconductor device. SOLUTION: The photoresist composition contains a resin (A) which contains a repeating unit having a specific partial structural and a repeating unit expressed by a specific structure and the solubility of which in an alkali developer increases by the action of an acid and a compound (B) generating the acid by active ray or radioactive ray irradiation.