| 摘要 |
PROBLEM TO BE SOLVED: To provide a small-sized ion implanting equipment capable of high- energy ion acceleration. SOLUTION: An accelerator 26 for accelerating an ion beam composed of desired ions which have been selected by a mass separator 24 is constituted as a synchrotron type accelerator. In other words, a ring-type path 32, through which the ion beam turns around, is provided with a high frequency electrode 33 to be an accelerating source and beam deflecting means 35a, 35b, 36a, 36b. After the ion beam is turned around and accelerated to have predetermined energy, it is made to outgo toward a wafer w. This miniaturizes the entire device, compared to a conventional linear-type direct-current accelerator (accelerating tube), reduces the area required for installation of the device, and realizes high-energy ion acceleration.
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