| 摘要 |
PURPOSE: A substrate is provided to form fine lines using photosensitive material by selectively exposing predetermined regions followed by development. CONSTITUTION: By processing similar to the processing for forming the lower thick-film wires(1), four layers of a photosensitive insulating paste were formed using a pattern. After passing through development and firing, the insulating layer(6) was formed so as to prevent the lower thick-film wires(1) from being exposed. Then, upper wires(7) were formed on the insulating film(6) according to processing similar to the processing for forming the lower thick-film wires(1). Thus, matrix wiring was provided by forming the lower thick-film wires(1) and the upper wires(7) via the interlayer insulating film(6) on the substrate(2).
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