| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive resist composition having superior resolving power and preservability and a radiation sensitive resist composition further having improved edge roughness. SOLUTION: Each of the radiation sensitive resist compositions contains (A) a resin having a velocity of dissolution in an alkali developing solution increased by the action of an acid, (B) a photo-acid generating agent, (C) a solvent and (D) a salt comprising a combination of a cyclic compound (D1) having at least one structure in which at least one bonding hand of -NH- bonds directly to at least one selected from -C(=O)-, -C(=S)- and -SO2- in one molecule and a compound (D2) containing at least one structure of formula (1) or (2). |
