ELECTRON RAY OR X-RAY RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive electron ray or X-ray resist composition exhibiting high sensitivity and high resolution, capable of giving excellent rectangular pattern profile and having excellent PCD and PED stability and coating property. SOLUTION: The positive electron ray or X-ray resist composition contains a compound (a1) generating an acid by electron ray or X-ray irradiation and a nitrogen-containing compound (b) having at least a specific partial structure in the molecule.