| 摘要 |
PURPOSE: Chamber equipment is provided to prevent a problem such as a minute deformation due to separation of a pedestal and a pedestal plate by improving a structure through one body. CONSTITUTION: Chamber equipment comprises a wafer station(300) made of a cylindric pedestal(300a) mounted with a wafer and a pedestal plate(300b) fabricated as one body with the cylindric-type pedestal(300a) and connected to the lower portion of the cylindric-type pedestal(300a), a heat supplying part(310) formed in the pedestal(300a), vacuum holes(320) formed on the upper portion of the pedestal(300a), an air outlet(325) formed on the pedestal plate(300b), a vacuum line(360) respectively connected with the air outlet(325) and a vacuum pump(370) at both ends, and a backside gas supplying part for preventing a formation of a needless layer on the rear surface of the wafer.
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