发明名称 PLASMA TREATMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment system which can excite a high-density, uniform, and high-frequency plasma in a treating vessel even when the vessel has a large size to treat an object to be treated having a relatively large area. SOLUTION: This plasma treatment system comprises the treating vessel 2 made of a conductive material, an exhaust pump which is used to exhaust the gas in the vessel 2, and a gas supplying means which introduces the gas to the vessel 2. The treatment system also comprises a placing base which is set up in the vessel 2 to place the object to be treated on the base and a plurality of high-frequency antennas 73 which are formed in planar spiral coil- like shapes on the outside of a treatment chamber through an insulating material 5.
申请公布号 JP2002176038(A) 申请公布日期 2002.06.21
申请号 JP20010292508 申请日期 2001.09.25
申请人 TOKYO ELECTRON LTD 发明人 ISHII NOBUO
分类号 H05H1/46;H01L21/302;H01L21/3065 主分类号 H05H1/46
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