发明名称 METHOD OF MANUFACTURING MULTILAYER HIGH DENSITY SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a multilayer high density, which can inexpensively manufacture the substrate of high density and fine pitch, can simplify the press-fitting procedure and can improve competitive power. SOLUTION: The circuit of a first layer is produced by the high density circuit forming method of a polyimide substrate. The surface circuit of high density thinning is obtained and the circuit is connected/diffused to a base layer. Since second and subsequent layer substrates do not need high density circuits such as the first layer substrate, they are produced by non-high density organic substrates 12 and the effect of a multilayer board is consequently obtained. Then, the cast of a material can remarkably be reduced. A welding projection connecting method is adopted in the connection of the surface layer of the second layer non-high density organic substrate 12 and a welding pad 113 at the base of the polyimide substrate of the first layer. A welding projection 125 is generated in the I/O contact point of the second layer and it is connected to the first layer polyimide substrate 11 by a press-fitting method. Thus, a manufacturing process can be simplified.
申请公布号 JP2002176264(A) 申请公布日期 2002.06.21
申请号 JP20010127329 申请日期 2001.04.25
申请人 ORIENT SEMICONDUCTOR ELECTRONICS LTD 发明人 HSIEN WEN-LO;SO EISEI;NING HUANG;PIN CHEN HUI;CHIANG HUA WEN;MING CHANG CHUANG;TU FENG CHANG;YU HUANG FU;JUI CHANG HSUAN;CHIEH HU CHIA
分类号 H05K3/40;H01L21/48;H05K3/28;H05K3/46;(IPC1-7):H05K3/46 主分类号 H05K3/40
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