发明名称 |
ELECTROMAGNETIC WAVE LOW-REFLECTION COATING GLASS |
摘要 |
PROBLEM TO BE SOLVED: To obtain glass with a film having excellent privacy performance, adiabatic performance and low reflectivity of electromagnetic waves. SOLUTION: This glass is formed by depositing an Si film consisting of 100 wt.% Si component by a sputtering method on the surface of a glass substrate and the glass substrate surface is subjected to bending and/or tempering after the deposition of the film.
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申请公布号 |
JP2002173339(A) |
申请公布日期 |
2002.06.21 |
申请号 |
JP20000373157 |
申请日期 |
2000.12.07 |
申请人 |
CENTRAL GLASS CO LTD |
发明人 |
ONISHI MASAJI;INOUE MOTOHARU |
分类号 |
C03C17/22;C03C17/34;C23C14/14;(IPC1-7):C03C17/22 |
主分类号 |
C03C17/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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