发明名称 ELECTROMAGNETIC WAVE LOW-REFLECTION COATING GLASS
摘要 PROBLEM TO BE SOLVED: To obtain glass with a film having excellent privacy performance, adiabatic performance and low reflectivity of electromagnetic waves. SOLUTION: This glass is formed by depositing an Si film consisting of 100 wt.% Si component by a sputtering method on the surface of a glass substrate and the glass substrate surface is subjected to bending and/or tempering after the deposition of the film.
申请公布号 JP2002173339(A) 申请公布日期 2002.06.21
申请号 JP20000373157 申请日期 2000.12.07
申请人 CENTRAL GLASS CO LTD 发明人 ONISHI MASAJI;INOUE MOTOHARU
分类号 C03C17/22;C03C17/34;C23C14/14;(IPC1-7):C03C17/22 主分类号 C03C17/22
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