发明名称 THIN FILM SEMICONDUCTOR ELEMENT AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To form an aggregate of crystal grain in priority orientation, whose grain diameter is small. SOLUTION: A semiconductor thin film is constituted of a plurality of crystal grains, and generation of projection in a boundary part of adjacent crystal grains is restrained by directing laser beam to an amorphous silicon film a plurality of times. Consequently, a polycrystalline silicon thin film element internally containing cluster crystal of an aggregate of at least two or more crystal grains is realized, and high mobility of 200 cm2/Vs or more is realized.
申请公布号 JP2002176180(A) 申请公布日期 2002.06.21
申请号 JP20000376561 申请日期 2000.12.06
申请人 HITACHI LTD 发明人 TAMURA TAKUO;OGATA KIYOSHI;TAKAHARA YOICHI;HORIKOSHI KAZUHIKO;YAMAGUCHI HIROKATSU;OKURA OSAMU;ABE HIRONOBU;SAITO MASAKAZU;KIMURA YOSHINOBU;ITOGA TOSHIHIKO
分类号 H01L21/205;H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L21/205
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