| 摘要 |
PROBLEM TO BE SOLVED: To provide a membrane forming apparatus and controlling method thereof capable of keeping heating temperature of a heater within a certain range in each membrane forming cycle when the heater is repeatedly used in a heater CVD method.SOLUTION: The controlling method of the membrane forming apparatus of the present invention is provided, in which membrane forming cycle is repeated, the membrane forming cycle comprising at least a preparation step in which vapor deposition target is arranged in a vacuum chamber, a membrane forming step in which thin membrane is formed on surface of the vapor deposition target and a removing step in which the vapor deposition target is removed from the vacuum chamber. Ingredient gas is gas containing C and H as constituent elements. A heater comprises metal which may become carbide as a constituent element. In addition, membrane forming resistance value as resistance value at a membrane forming temperature has changeable property along with repeat of membrane forming cycle. In the membrane forming step, voltage applied to the heater according to previously created voltage profile including application voltage information required for bring the heater at the membrane forming temperature.SELECTED DRAWING: Figure 2 |
