发明名称 |
METHOD OF REDUCING PLASMA-INDUCED DAMAGE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of reducing plasma-induced damage by performing the ramping down of a plasma source power after the accumulation of the plasma source power which is used for producing a plasma and to provide a plasma-induced damage reducing device. SOLUTION: A plasma power is reduced to one or more intermediate levels as a time function reversely to stop power suddenly and completely. As shown in the step 109, a power ramp down procedure may be performed in discontinuous steps. That is, the plasma power is set at some intermediate levels during a certain time or in a continuous manner as a time function. The power ramp down procedure gradually changes the plasma environment around a substrate and helps to lessen as small as possible substrate damage due to plasma-induced effects. |
申请公布号 |
JP2002176047(A) |
申请公布日期 |
2002.06.21 |
申请号 |
JP20010294403 |
申请日期 |
2001.09.26 |
申请人 |
APPLIED MATERIALS INC |
发明人 |
CAMPANA-SCHMITT FRANCIMAR;SCHIMANKE CARSTEN |
分类号 |
H05H1/46;C23C16/50;C23C16/52;H01J37/32;H01L21/31;H01L21/316;H05H1/00 |
主分类号 |
H05H1/46 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|