发明名称 METHOD OF REDUCING PLASMA-INDUCED DAMAGE
摘要 PROBLEM TO BE SOLVED: To provide a method of reducing plasma-induced damage by performing the ramping down of a plasma source power after the accumulation of the plasma source power which is used for producing a plasma and to provide a plasma-induced damage reducing device. SOLUTION: A plasma power is reduced to one or more intermediate levels as a time function reversely to stop power suddenly and completely. As shown in the step 109, a power ramp down procedure may be performed in discontinuous steps. That is, the plasma power is set at some intermediate levels during a certain time or in a continuous manner as a time function. The power ramp down procedure gradually changes the plasma environment around a substrate and helps to lessen as small as possible substrate damage due to plasma-induced effects.
申请公布号 JP2002176047(A) 申请公布日期 2002.06.21
申请号 JP20010294403 申请日期 2001.09.26
申请人 APPLIED MATERIALS INC 发明人 CAMPANA-SCHMITT FRANCIMAR;SCHIMANKE CARSTEN
分类号 H05H1/46;C23C16/50;C23C16/52;H01J37/32;H01L21/31;H01L21/316;H05H1/00 主分类号 H05H1/46
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